A new polymer-supported radical source was developed by loading an N-hydroxy thiazole 2(3)-thione on a Wang resin. This new supported reagent can be employed for a solid-phase version of the Hunsdiecker reaction or to liberate free alkoxy radicals, in a variant of the “catch and release” technique, under very mild conditions (irradiation with a discharge lamp) and simplifying the purification procedure.
DE LUCA, L., Giacomelli, G., Porcu, G., Taddei, M. (2001). A new supported reagent for the photochemical generation of radicals in solution. ORGANIC LETTERS, 3(6), 855-857 [10.1021/ol007032b].
A new supported reagent for the photochemical generation of radicals in solution
Taddei, Maurizio
2001-01-01
Abstract
A new polymer-supported radical source was developed by loading an N-hydroxy thiazole 2(3)-thione on a Wang resin. This new supported reagent can be employed for a solid-phase version of the Hunsdiecker reaction or to liberate free alkoxy radicals, in a variant of the “catch and release” technique, under very mild conditions (irradiation with a discharge lamp) and simplifying the purification procedure.
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https://hdl.handle.net/11365/8952
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