Using a combination of automated diffraction tomography and precession electron diffraction techniques, quasi-kinematical electron diffraction data sets were collected from intermetallic Ni 1+xTe 1embedded nanodomains and ion-thinned specimens of 6H-SiC semiconductor. Cell parameters and space groups were found automatically from the reconstructed 3D diffraction volume. The extracted intensities were used for fast ab initio structure determination by direct methods. © 2012 IOP Publishing Ltd.
Sarakinou, E., Mugnaioli, E., Lioutas, C.B., Vouroutzis, N., Frangis, N., Kolb, U., et al. (2012). Structure characterization of hard materials by precession electron diffraction and automatic diffraction tomography: 6H-SiC semiconductor and Ni1+xTe1 embedded nanodomains. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 27(10) [10.1088/0268-1242/27/10/105003].
Structure characterization of hard materials by precession electron diffraction and automatic diffraction tomography: 6H-SiC semiconductor and Ni1+xTe1 embedded nanodomains
MUGNAIOLI, E.;
2012-01-01
Abstract
Using a combination of automated diffraction tomography and precession electron diffraction techniques, quasi-kinematical electron diffraction data sets were collected from intermetallic Ni 1+xTe 1embedded nanodomains and ion-thinned specimens of 6H-SiC semiconductor. Cell parameters and space groups were found automatically from the reconstructed 3D diffraction volume. The extracted intensities were used for fast ab initio structure determination by direct methods. © 2012 IOP Publishing Ltd.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
https://hdl.handle.net/11365/841644
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