We compare transitions observed in photoabsorption spectra above the oxygen and nitrogen K edges in several compounds and chemisorption systems with transitions excited by the process of electron-energy loss detected in the reflection mode. We find few but significant discrepancies between the two, mainly attributable to quadrupole transitions and double inelastic scattering in the electron-energy-loss spectra. The problem of the extraction of structural information from the measurements is considered.
|Titolo:||Comparison between optically excited and electron-excited transitions above oxygen and nitrogen K edges in Cu2O, O/Al, O/Ni, SiO2 and Si3N4|
|Citazione:||Della Valle, F., Comelli, G., Zanini, F., Rosei, R., & Paolucci, G. (1988). Comparison between optically excited and electron-excited transitions above oxygen and nitrogen K edges in Cu2O, O/Al, O/Ni, SiO2 and Si3N4. PHYSICAL REVIEW. B, CONDENSED MATTER, 38, 13355-13360.|
|Appare nelle tipologie:||1.1 Articolo in rivista|
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